SCALP Facility :
JANNuS-Orsay, in situ dual ion beam TEM

In situ Transmission Electron Microscopy (TEM) is a speciality of the CSNSM lab since the early 1980’s. A TEM and a 190 kV ion implantor (called IRMA) were connected together under the guidance of Marie-Odile Ruault, allowing in situ observations of modification of materials under ion beam. Several research projects took place mainly on ion beam synthesis of materials using this peculiar equipment, on which a new 120 keV microscope was installed in 1994. The facility was updated in 2006 with the arrival of a new 200 kV FEI Tecnai 200kV G2 TEM and a new ion beam line connected to ARAMIS, a 2 MV Tandem / Van de Graaff homemade accelerator, built in the late 80’s. This connection of a TEM and two ion beam lines coming from IRMA ion implantor and ARAMIS ion accelerator is called JANNuS-Orsay. Together with JANNuS-Saclay it forms since 2005 the multi-ion beam irradiation platform JANNuS for Joint Accelerators for Nanosciences and Nuclear Simulation. JANNuS-Orsay is part of the SCALP accelerators platform of the CSNSM lab, located in Orsay, France.

Overview of the Transmission Electron Microscope with its two ion beam connections seen on the left (© C. Baumier (CSNSM))

The facility is now operating according to three modes : i) TEM + IRMA, ii) TEM + ARAMIS and iii) TEM in dual beam mode (TEM + IRMA + ARAMIS), at a chosen temperature in the range 77 - 1300 K, allowing in situ observation and analysis of the material microstructure modifications induced by single or dual ion implantation/irradiation. Several analytical equipments (e.g. EELS, STEM, EDX) are also available on the microscope for chemical analysis for example. JANNuS-Orsay is opened to any proposal either through the EMIR federation or direct quotation. Every experiment requires the presence of an experienced microscopist, presence that must be planned by the project leader. Beam time is also opened through EMIR call each year on the accelerator ARAMIS for on-line experiments only (resistivity measurements, ARAMIS + IRMA connection for in situ RBS-C experiments with ion implantation/irradiation, any on line instrumentation provided by the user, ...).

Several research topics studied so far at the JANNuS-Orsay facility, for different materials (semiconductors, metallic alloys, ceramic oxides, glasses), are listed below (not exhaustive) :
- nucleation and growth of nanoprecipitates (ion beam synthesis)
- irradiation-induced defects (role of T, fluence, flux, energy, nature of the ion)
- void swelling under irradiation
- phase precipitation or dissolution under ion irradiation
- ordering/disordering under ion beam(s)


- M.-O. Ruault, F. Fortuna, H. Bernas, J. Chaumont, O. Kaïtasov, In situ transmission electron microscopy ion irradiation studies at Orsay, J. Mater. Res. 20, 1758 (2005)
- N. Chauvin, S. Henry, H. Flocard, F. Fortuna, O. Kaitasov, P. Pariset, S. Pellegrino, M.O. Ruault, Y. Serruys, P. Trocellier, Optics calculations and beam line design for the JANNuS facility in Orsay , Nuclear Instruments and Methods in Physics Research Section B 261, 34 (2007)
- Y. Serruys, P. Trocellier, S. Miro, E. Bordas, M.O. Ruault, O. Kaïtasov, S. Henry, O. Leseigneur, Th. Bonnaillie, S. Pellegrino, S. Vaubaillon, and D. Uriot, JANNUS : A multi-irradiation platform for experimental validation at the scale of the atomistic modelling. J. Nucl. Mater. 386, 967 (2009).
- C.-O. Bacri, C. Bachelet, C. Baumier, J. Bourçois, L. Delbecq, D. Ledu, N. Pauwels, S. Picard, S. Renouf, C. Tanguy, SCALP, a platform dedicated to material modifications and characterization under ion beam, Nucl. Instrum. Methods B 406, 48 (2017)